Aluminum Silicon Manganese Alloy, Sputtering Target, 99.9%, 50 mm dia x 4 mm th.

Used as a master alloy in the production of high-strength aluminum alloys to improve castability, wear resistance, and mechanical properties.

Fabricated into sputtering targets for the deposition of thin films used in microelectronics and protective coatings to enhance corrosion resistance.

Utilized in additive manufacturing processes to create complex, lightweight structural components with high thermal stability.