Boron Oxide, Sputtering Target, 99.9%, 3 inch dia x 0.25 inch th.

Boron oxide is used as a fluxing agent and a component in specialized optical glasses and thin-film coatings to adjust refractive index and improve chemical durability.

Used as a high-purity source material in vacuum evaporation processes for the deposition of boron-containing dielectric layers.

Utilized as a dopant source in the manufacture of silicon semiconductors and as a component in Liquid Encapsulated Czochralski (LEC) growth of gallium arsenide crystals.