Barium, Sputtering Target, 99.9%, 4 inch dia x 0.25 inch th.

Barium is used as a sputtering target material for the deposition of thin films in the production of high-temperature superconductors and ferroelectric layers.

Barium is used as an alloying agent to remove unwanted gases from molten metals and to improve the grain structure of magnesium and aluminum alloys.

Barium metal is utilized as an evaporation material, often as a getter to remove trace gases in vacuum tubes and CRT displays.