Barium Calcium Cuprate, Sputtering Target, 99.9%, 6 inch dia x 0.25 inch th.

Barium calcium cuprate is utilized as a target material in sputtering processes to deposit high-temperature superconducting thin films, specifically for the synthesis of Tl-Ba-Ca-Cu-O or Hg-Ba-Ca-Cu-O phases.

This material serves as a precursor or active component in the fabrication of high-critical-temperature (High-Tc) superconducting ceramics used in advanced semiconductor device interfaces and Josephson junctions.