Barium Potassium Bismuth Oxide, Sputtering Target, 99.9%, 1 inch dia x 0.125 inch th.

Barium Potassium Bismuth Oxide is utilized as a sputtering target material for the deposition of superconducting thin films in research and electronic device fabrication.

As a high-temperature superconductor with a cubic structure, it is studied for its unique electronic properties and potential integration into advanced semiconductor heterostructures.