Barium tin oxide, Sputtering Target, 99.9%, 2 inch dia x 0.125 inch th.

Barium tin oxide is used as a sputtering target material to deposit transparent conducting oxide (TCO) thin films for electronic and photovoltaic devices.

BaSnO3 is a wide-bandgap semiconductor utilized in high-power and high-frequency electronic applications due to its high oxygen stability and electron mobility.

Used in the fabrication of transparent electrodes and optoelectronic devices where high optical transparency and electrical conductivity are required.