Barium Titanium Oxide (Nb doped), Sputtering Target, 99.9%, 1 inch dia x 0.125 inch th.

Niobium-doped barium titanate targets are used in physical vapor deposition to create semiconducting ferroelectric thin films for electronic components.

The introduction of Nb5+ ions into the BaTiO3 lattice acts as an n-type dopant, significantly increasing the electrical conductivity for use in thermistors and multilayer ceramic capacitors.

Used in the fabrication of thin films that exhibit electro-optic properties suitable for optical modulators and integrated photonic circuits.