Barium Titanate (Barium Titanium Oxide), Sputtering Target, 99.95%, MRC (4.75 inch x 14.875 inch x 0.250 inch th.)

Barium titanate is used as a sputtering target material to deposit high-permittivity ferroelectric thin films for integrated capacitors and non-volatile memory devices.

Utilized in optoelectronic devices due to its strong photorefractive effect and electro-optic properties, making it suitable for optical computing and phase conjugation.

Produced as nanocrystals and nanopowders to enhance the dielectric properties of polymer-ceramic composites and miniaturized multilayer ceramic capacitors (MLCCs).