Beryllium, Sputtering Target, 99.8%, 2 inch dia x 0.125 inch th.

Beryllium sputtering targets are used to deposit thin films for X-ray window applications and specialized semiconductor components due to its low atomic number and high stiffness.

Beryllium is a critical alloying agent in copper-beryllium alloys, significantly increasing electrical conductivity, thermal conductivity, and mechanical strength for aerospace and electronic connectors.

Due to its high melting point and dimensional stability, beryllium is utilized in high-temperature structural components and refractory environments.

High-purity beryllium is used as an evaporation source in physical vapor deposition processes to create lightweight, rigid reflective coatings for optical systems.