Bismuth Antimony Telluride, Sputtering Target, 99.999%, 4 inch dia x 0.125 inch th.

Bismuth Antimony Telluride is used as a sputtering target material to deposit high-performance p-type thermoelectric thin films for micro-cooling and energy harvesting devices.

This material acts as a narrow-bandgap semiconductor and is a primary component in the fabrication of solid-state Peltier coolers and thermoelectric generators.

Used in physical vapor deposition processes to create thin-film topological insulators and thermoelectric layers for electronic applications.