Bismuth, Sputtering Target, 99.99%, 250 mm x 350 mm x 5 mm th.

Bismuth sputtering targets are used to deposit thin films for optical coatings, superconducting materials, and electronic components.

Bismuth is used as an alloying agent to create low-melting-point alloys (fusible alloys) and as a non-toxic replacement for lead in free-machining steels and brasses.

High-purity bismuth is utilized as an evaporation source for the thermal evaporation deposition of thin films in semiconductor and sensor manufacturing.

Bismuth is used in the production of compound semiconductors such as Bismuth Telluride (Bi2Te3) for thermoelectric cooling and power generation applications.