Bismuth Silicon Oxide
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
Size
3 inch dia x 0.125 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPBI2SIO53D3T4N
Hazmat
Not hazardous for transportation
Catalog Number
5047
Description
Comments
Bismuth Silicon Oxide is utilized as a sputtering target material for the deposition of thin films in optical and dielectric applications.
Used in the fabrication of photorefractive and electro-optic devices due to its high photosensitivity and dielectric properties.
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