Chemical Name
Bismuth
Chemical Formula
Bi
Purity
99.999%
Composition
Size
4 inch dia x 0.25 inch th.
EINECS Number
231-177-4
Quantity Available
pcs
CAS Number
7440-69-9
Status
Product ID
SPBI4D6T0005N
Hazmat
Powder: Class 4.1, UN3089, PG II
Catalog Number
671
Description
Comments
RD~99%, Product subject to export control 1C229 Please note that commodity prices for this product are highly volatile. Please request a quote to verify the current pricing and confirm its validity.
Bismuth sputtering targets are used to deposit thin films for optical coatings, superconducting materials, and electronic components.
Bismuth is used as an alloying agent to create low-melting-point alloys (fusible alloys) and as a non-toxic replacement for lead in free-machining steels and brasses.
High-purity bismuth is utilized as an evaporation source for the thermal evaporation deposition of thin films in semiconductor and sensor manufacturing.
Bismuth is used in the production of compound semiconductors such as Bismuth Telluride (Bi2Te3) for thermoelectric cooling and power generation applications.
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