Bismuth Cobalt Oxide, Sputtering Target, 99.95%, 1 inch dia x 0.25 inch th.

Bismuth Cobalt Oxide is used as a sputtering target material for the deposition of multiferroic thin films in electronic and spintronic device research.

Utilized in the development of advanced optoelectronic components due to its unique ferroelectric and magnetic properties at the nanoscale.