Bismuth Iron Manganese Oxide, Sputtering Target, 99.9%, 2 inch dia x 0.125 inch th.

BiFeMnO3 is utilized as a sputtering target material for the deposition of multiferroic thin films, enabling the study of magnetoelectric coupling in electronic devices.

This material is synthesized in nanoparticle or thin-film form to exploit its unique multiferroic properties at the nanoscale for advanced memory and sensor applications.