Bismuth Ferrite
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
Bi(1.1)FeO3
Size
2 inch dia x 0.125 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
12010-42-3
Status
Product ID
SPBIFEO32D3T4N-1
Hazmat
Not hazardous for transportation
Catalog Number
9454
Description
10% Bi saturated
Comments
Bismuth Ferrite sputtering targets are used to deposit multiferroic thin films for advanced memory devices and spintronic applications.
Utilized in optoelectronic devices due to its narrow bandgap and ferroelectric properties, which enable photovoltaic effects and light-controlled actuators.
Synthesized as nanoparticles or nanofibers for use in photocatalysis and magnetoelectric sensors at the nanoscale.
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