Bismuth Gallium Oxide, Sputtering Target, 99.99%, 3 inch dia x 0.125 inch th.

Bismuth Gallium Oxide is utilized as a sputtering target material for the deposition of thin films in the development of multiferroic and piezoelectric electronic components.

Used in the fabrication of specialized optical thin films and nonlinear optical devices due to its high refractive index and dielectric properties.