Bismuth Germanium Oxide
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
Size
3 inch dia x 0.25 inch th.
EINECS Number
235-457-7
Quantity Available
pcs
CAS Number
12233-56-6
Status
Product ID
SPBIGEO3D6T4N
Hazmat
Not hazardous for transportation
Catalog Number
5549
Description
Comments
Bismuth Germanium Oxide is used as a sputtering target material to deposit thin films for high-energy physics detectors and medical imaging applications due to its high stopping power for gamma rays.
BGO thin films are applied via vacuum deposition techniques to create specialized optical coatings that leverage its high refractive index and scintillation properties.
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