Bismuth Indium Alloy, Sputtering Target, 99.9%, 100 mm x 250 mm x 5 mm th.

Bismuth Indium alloy targets are used in sputtering processes to create thin films for optical discs and specialized semiconductor coatings.

Used as a low-temperature solder and interface material in semiconductor packaging and for creating III-V compound semiconductor precursors.

Utilized as a source material in physical vapor deposition to deposit thin metallic films with specific thermal and electronic properties.