Bismuth Indium Oxide, Sputtering Target, 99.9%, 1 inch dia x 5 mm th.

Bismuth Indium Oxide is utilized as a sputtering target material for the deposition of thin films in the development of high-dielectric constant materials and specialized optical coatings.

Used in the fabrication of thin-film components for optoelectronic devices due to its specific bandgap properties and refractive index.

Investigated as a ternary oxide semiconductor material for use in advanced electronic gate dielectrics and transparent conducting oxide research.