Bismuth Manganate (Bismuth Manganese Oxide), Sputtering Target, 99.95%, 2 inch dia x 0.125 inch th.

Bismuth Manganate targets are used in sputtering processes to deposit multiferroic thin films for research into next-generation magnetoelectric memory devices.

BiMnO3 is synthesized as nanomaterials to study the enhancement of ferromagnetic and ferroelectric properties at the nanoscale for electronic applications.