Bismuth Antimonide, Sputtering Target, 99.99%, 1.55 inch dia x 4 mm th.

Bismuth Antimonide alloys are utilized as narrow-gap semiconductors and topological insulators for thermoelectric cooling and infrared detection applications.

Bismuth Antimonide is used as a sputtering target material to create thin films for magneto-optical recording and thermoelectric micro-devices.

BiSb is employed as an evaporation source in physical vapor deposition processes to produce thin-film layers for electronic and sensor components.