Bismuth Silicon Oxide, Sputtering Target, 99.99%, 3 inch dia x 0.125 inch th.

Bismuth Silicon Oxide is utilized as a sputtering target material for the deposition of thin films in optical and piezoelectric device fabrication.

Bi4Si3O12 (BSO) is a widely used scintillator material in optoelectronic systems for detecting gamma rays and X-rays due to its high effective atomic number and fast decay time.

Used as a source material for creating optical coatings that leverage its refractive index and transparency for specialized photonic applications.