Bismuth titanium oxide, Sputtering Target, 99.999%, 3 inch dia x 0.125 inch th.

Bismuth titanate targets are used in RF magnetron sputtering to deposit ferroelectric thin films for non-volatile random access memory (FeRAM) and piezoelectric sensor applications.

Used as a high-refractive index material in the fabrication of multilayer optical coatings and waveguides due to its excellent electro-optic properties.

Utilized in high-temperature ceramic formulations due to its high melting point and stability as a bismuth-based Aurivillius phase material.