Bismuth Titanium Oxide, Sputtering Target, 99.9%, 3 inch dia x 0.25 inch th.

Bismuth titanium oxide is used as a sputtering target material for the deposition of dielectric and ferroelectric thin films in microelectronic devices.

Utilized in the fabrication of thin films for electro-optic modulators and optical storage devices due to its high refractive index and dielectric properties.

Applied as a high-k dielectric material in semiconductor manufacturing to improve the capacitance and performance of integrated circuits.