Bismuth Oxide-Yttrium Oxide-Iron Oxide, Sputtering Target, 99.99%, 2 inch dia x 5 mm th.

Used as a target material for the deposition of bismuth-substituted yttrium iron garnet (Bi-YIG) thin films, which are essential for magneto-optical devices and isolators.

Applied as a magneto-optical layer in thin-film stacks to enable Faraday rotation and non-reciprocal light propagation in optical communication components.