Boron Phosphorus, Sputtering Target, 99.9%, 3 inch dia x 0.125 inch th.

Boron phosphide is a wide-bandgap III-V semiconductor used in the fabrication of high-power and high-frequency electronic devices due to its high thermal conductivity and chemical stability.

Boron phosphide targets are utilized in sputtering processes to deposit thin films for wear-resistant coatings and specialized semiconductor layers.

Due to its high melting point and extreme hardness, boron phosphide is employed as a refractory material in environments requiring high chemical and thermal resistance.