Calcium Oxide, Sputtering Target, 99.95%, 2 inch dia x 3 mm th.

Calcium oxide is used as a high-temperature refractory material for lining furnaces and crucibles due to its high melting point and thermodynamic stability.

Used in high-temperature chemical processing and as a flux in metallurgical applications to remove impurities from molten metals.

Calcium oxide is utilized as a source material in vacuum evaporation processes to create thin films for protective or optical layers.

CaO targets are used in sputtering processes to deposit thin dielectric films or as a component in complex oxide thin-film research.