Cerium fluoride, Sputtering Target, 99.95%, 2 inch dia x 0.125 inch th.

Used as a precursor in the production of cerium metal and as a component in the manufacture of specialized glass and ceramics.

Utilized as a low-refractive index material for multilayer optical coatings, providing durability and transparency in the ultraviolet to infrared spectrum.

Employed as a high-purity source material for physical vapor deposition to create thin films for optical and electronic components.

Used as a target material in sputtering processes to deposit protective or functional cerium fluoride thin films on substrates.