Cobalt, Sputtering Target, 99.99%, 54 mm dia x 0.3 mm th.

Cobalt is a critical alloying element used to produce superalloys with high thermal stability and wear resistance for aerospace and industrial turbine components.

High-purity cobalt sputtering targets are utilized to deposit thin films for magnetic recording media and integrated circuit metallization.

Cobalt is a primary component in Lithium Cobalt Oxide (LCO) and Nickel Manganese Cobalt (NMC) cathodes, providing high energy density and structural stability.

Cobalt pellets and pieces are used as evaporation materials in physical vapor deposition processes to create magnetic and decorative thin-film coatings.

Cobalt-chrome powders are widely used in additive manufacturing for medical implants and high-temperature aerospace parts due to their biocompatibility and strength.