Cobalt Iron Boron
Sputtering TargetCobalt Iron Boron, Sputtering Target, 99.95%, 2 inch dia x 10 mm th.
Tags: AlloysSputtering
Product Specifications
Chemical Name
Chemical Formula
Purity
99.95%
Composition
20:60:20 at%
Size
2 inch dia x 10 mm th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPCOFEB2D10T3N5
Hazmat
Not hazardous for transportation
Catalog Number
5595
Description
Comments
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Element Name
Cobalt Iron Boron
Symbol
CoFeB
Atomic Number
-
Atomic Weight
-
Melting Point
1100-1200 °C
Boiling Point
-
Density
7.8 - 8.2 g/cm³
Crystal Structure
Amorphous
Color / Appearance
Metallic gray
Thermal Conductivity
-
Electrical Resistivity
100 - 200 µΩ·cm
Coefficient of Thermal Expansion
-
Electronegativity
-
Neutron Cross Section
-
Electron Configuration
-
This Product
SPCOFEB2D10T3N5
Form
Sputtering Target
Purity
99.95%
Composition
20:60:20 at%
Size
2 inch dia x 10 mm th.
Quantity Available
pcs
Catalog Number
5595
info
Sputtering
Cobalt Iron Boron is frequently used as a sputtering target material to deposit thin films for magnetic tunnel junctions (MTJs) and spintronic devices due to its high spin polarization and amorphous structure.
info
Semiconductors
CoFeB thin films are integrated into semiconductor-based memory technologies, specifically Spin-Transfer Torque Magnetic Random Access Memory (STT-MRAM), as a key electrode material.
warning
HazMat Classification
Not hazardous for transportation
description
Documentation
Safety Data Sheet (SDS) and Certificate of Analysis (COA) available for download. GHS-compliant labeling provided with all shipments.
local_shipping
Shipping
Shipped via FedEx Ground or UPS. Hazmat surcharges apply. International orders may require export compliance review. Custom packaging available.
verified
Quality Assurance
All products supplied with lot-specific COA including ICP-OES elemental analysis, XRD phase identification, and particle size distribution data.
description
Certificates of Analysis (COA)
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