Cobalt Iron Silicon, Sputtering Target, 99.95%, 2 inch dia x 0.125 inch th.

Cobalt Iron Silicon is utilized as a sputtering target material for the deposition of magnetic thin films, often employed in the fabrication of magnetic sensors and recording heads.

This ternary silicide compound is investigated for its potential in spintronic applications and as a contact material in semiconductor device architectures due to its magnetic and conductive properties.