Cobalt Gallium Alloy
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
(50/50 at%) Co:Ga
Size
3 inch dia x 0.125 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPCOGA3D3T04N
Hazmat
Catalog Number
8083
Description
Comments
Cobalt Gallium alloy targets are used in sputtering processes to create thin films for magnetic and magneto-optical storage media.
CoGa is utilized as a stable, epitaxial metallic contact material on III-V semiconductors like Gallium Arsenide due to its lattice matching properties.
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