Cobalt Manganese Silicon Alloy
Sputtering TargetChemical Name
Chemical Formula
Purity
99.95%
Composition
28:12:60 at%
Size
2 inch dia x 0.25 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPCOMNSI2D6T3N5
Hazmat
Catalog Number
5542
Description
Comments
Cobalt Manganese Silicon alloy targets are used in magnetron sputtering processes to create thin films for spintronic devices and magnetic sensors due to their half-metallic ferromagnetic properties.
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