Chromium Silicide, Sputtering Target, 99.5%, 3 inch dia x 0.125 inch th.

Chromium silicide is used as a sputtering target material to create thin films for microelectronic components and integrated circuits, providing high-temperature stability and oxidation resistance.

CrSi2 is a narrow-bandgap semiconductor used in the fabrication of thermoelectric devices and as a contact material in silicon-based microelectronics.

Due to its high melting point and chemical stability, chromium silicide is utilized in refractory applications where resistance to oxidation and thermal shock is required.