Copper Iron, Sputtering Target, 99.95%, 3 inch dia x 0.0625 inch th.

Copper-iron alloy targets are used in physical vapor deposition to create magnetic thin films and giant magnetoresistance (GMR) sensors.

Used as a master alloy to introduce iron into copper-based systems to improve mechanical strength and grain refinement without significantly compromising conductivity.

Gas-atomized copper-iron powders are utilized in additive manufacturing for producing components that require a balance of thermal conductivity and structural integrity.