Copper Gallium Alloy
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
75:25 wt%
Size
4 inch dia x 0.25 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPCUGA4D6T04N-1
Hazmat
Powder: Class 4.1, UN3089, PG III Marine Pollutant
Catalog Number
5805
Description
Comments
Copper Gallium alloy targets are used in magnetron sputtering processes to deposit precursor layers for the fabrication of CIGS (Copper Indium Gallium Selenide) thin-film solar cells.
Used as a source material in the production of compound semiconductor thin films, specifically for optimizing the bandgap in photovoltaic devices.
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