Copper Gallium Oxide, Sputtering Target, 99.9%, 3 inch dia x 0.125 inch th.

Used as a p-type transparent conducting oxide (TCO) for the fabrication of transparent electronics and ultraviolet photodetectors.

Acts as a wide-bandgap p-type semiconductor material in thin-film transistors and heterojunction solar cells.

Fabricated into ceramic sputtering targets for the deposition of CuGaO2 thin films via physical vapor deposition techniques.