Copper Indium Alloy
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
50:50 at%
Size
4 inch dia x 0.25 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPCUIN4D6T04N-1
Hazmat
Powder: Class 4.1, UN3089, PG III
Catalog Number
4640
Description
Comments
Copper Indium alloy targets are used in magnetron sputtering processes to deposit precursor thin films for the fabrication of CIGS (Copper Indium Gallium Selenide) solar cells.
Used as a precursor material in the synthesis of ternary and quaternary semiconductor compounds for photovoltaic applications.
Utilized in physical vapor deposition processes to create uniform metallic layers for electronic and optoelectronic device manufacturing.
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