Cupric (II) Oxide, Sputtering Target, 99.9%, 3 inch dia x 0.25 inch th.

Cupric oxide is used as a sputtering target material for the deposition of thin films in the fabrication of p-type oxide semiconductors and high-temperature superconductors.

Used in vacuum deposition processes to create thin films with specific refractive indices and absorption properties for optical filters and sensors.

Investigated as a high-capacity conversion-type electrode material for lithium-ion batteries due to its theoretical capacity and electrochemical reactivity.

Produced in nanoparticle form for use in catalysis, gas sensors, and antimicrobial coatings due to its high surface-area-to-volume ratio.

Acts as a p-type semiconductor with a narrow bandgap, utilized in the development of solar cells, photodetectors, and electronic switching devices.