Erbium Oxide, Sputtering Target, 99.95%, 3 inch dia x 0.25 inch th.

Used as a dopant in optical fibers and amplifiers (EDFAs) due to its unique luminescence properties in the infrared spectrum.

Utilized in the fabrication of lasers and optical communication devices because of its narrow-band emission at 1.5 micrometers.

High-purity Erbium Oxide targets are used in magnetron sputtering to create thin films for dielectric layers and optical coatings.

Applied as a thin film coating to manage light transmission and reflection in specialized glass and infrared optics.

Used as a source material in physical vapor deposition processes to create protective and functional thin films.