Iron oxide
Sputtering TargetChemical Name
Chemical Formula
Purity
99.9%
Composition
50:50 mol%
Size
3 inch dia x 0.125 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPFE23O343D3T3N
Hazmat
Catalog Number
7972
Description
Comments
Iron oxide targets are used in magnetron sputtering to deposit thin films for magnetic storage media, gas sensors, and decorative coatings.
Iron oxides, particularly Fe3O4 and Fe2O3, are utilized as conversion-type anode materials in lithium-ion batteries due to their high theoretical capacity.
Superparamagnetic iron oxide nanoparticles (SPIONs) are synthesized for use in targeted drug delivery, magnetic resonance imaging (MRI) contrast agents, and ferrofluids.
Iron oxide thin films are applied via vacuum deposition to create interference filters and to control light absorption in specialized optical components.
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