Iron Silicide, Sputtering Target, 99.95%, 3 inch dia x 0.196 inch th.

Iron silicide targets are used in physical vapor deposition to create thin films for magnetic sensors and microelectronic components.

Used in the development of spintronic devices and epitaxial layers for silicon-based semiconductor integration.

Utilized as an additive in specialized steel and magnetic alloys to improve soft magnetic properties and corrosion resistance.