Iron Chromium Silicon, Sputtering Target, 99.9%, 300 mm dia x 6.35 mm th.

FeCrSi alloys are used as sputtering target materials to deposit thin films for thin-film resistors and electromagnetic interference (EMI) shielding applications.

Used as an additive in the production of specialized steels and magnetic alloys to improve corrosion resistance and electrical properties.

Utilized in thermal spray processes to create wear-resistant and oxidation-resistant coatings on industrial components.