Iron Copper Niobium Silicon Boron, Sputtering Target, 99.9%, 2 inch dia x 0.125 inch th.

FeCuNbSiB targets are used in sputtering processes to deposit soft magnetic thin films for high-frequency electronic components and sensors.

This alloy is a precursor for Finemet-type nanocrystalline materials, where controlled crystallization produces grains in the 10-20 nm range for superior magnetic permeability.