Iron Gallium Alloy, Sputtering Target, 99.95%, 2 inch dia x 0.125 inch th.

Iron Gallium (Galfenol) targets are used in magnetron sputtering to deposit magnetostrictive thin films for sensors, actuators, and microelectromechanical systems (MEMS).

Used as a specialized magnetostrictive alloy that combines the mechanical robustness of iron with high magnetic sensitivity for structural applications.