Iron Oxide-Cobalt Oxide(50:50), Sputtering Target, 99.9%, 4 inch dia x 0.125 inch th.

Used as a precursor material for the fabrication of cobalt ferrite (CoFe2O4) thin films via magnetron sputtering for magnetic storage and sensor applications.

Utilized in physical vapor deposition processes to create magnetic oxide layers and thin-film coatings.

Investigated as a composite metal oxide electrode material to enhance capacity and cycling stability in lithium-ion battery systems.