Iron Phosphide, Sputtering Target, 99.9%, 3 inch dia x 3 mm th.

Iron phosphide is utilized as a sputtering target material for the deposition of thin films in magnetic and electrochemical research applications.

Iron phosphide is investigated as a high-capacity anode material for lithium-ion batteries due to its high theoretical capacity and good electronic conductivity.

FeP is studied as a transition metal phosphide semiconductor for potential use in photocatalysis and electronic device components.