Iron Silicide, Sputtering Target, 99.9%, 3 inch dia x 0.125 inch th.

Iron silicide is used as a sputtering target material to create thin films for thermoelectric devices and magnetic sensors.

Beta-phase iron disilicide (β-FeSi2) is utilized as a semiconducting material for near-infrared optoelectronic devices and silicon-based photonics.

Used in the fabrication of light-emitting diodes and photodetectors that are compatible with standard silicon integrated circuit technology.

Used as an additive in the production of specialized steel and magnetic alloys to improve corrosion resistance and magnetic properties.