Iron Silicon Boron, Sputtering Target, 99.95%, 3 inch dia x 0.06 inch th.

FeSiB targets are used in magnetron sputtering to deposit soft magnetic thin films for sensors, magnetic heads, and electromagnetic interference shielding.

Gas-atomized FeSiB amorphous powders are utilized in additive manufacturing to produce complex-shaped soft magnetic components with low core loss.

FeSiB-based powders are applied via high-velocity oxy-fuel (HVOF) spraying to create amorphous metallic glass coatings that provide exceptional wear and corrosion resistance.